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Iordanov, Petar, Keville, Bernard, Ringwood, John, Doherty, Sean and Faulkner, Ronan (2006) On the closed-loop control of an argon plasma process. In: Irish Signals and Systems Conference (ISSC 2006), June 2006, Dublin.
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Abstract
Closed-loop control of a plasma process for etching ap-
plications is discussed in this study. Plasma processes are highly
nonlinear systems that typically feature complex chemical and phys-
ical reactions. A laboratory-based plasma reactor is presented in this
work, and issues concerning its closed-loop control are discussed. A
PID controller for the experimental plasma process is developed and
its performance is analysed. The need for a more advance control
methodology is studied and some appropriate control structures are
proposed. Finally, a description of the practical implementation of
real-time multivariable closed-loop control for the studied plasma re-
actor is presented.
| Item Type: | Conference or Workshop Item (Paper) |
|---|---|
| Additional Information: | This work has been undertaken within the Plas- MAC project, a joint collaboration between Na- tional University of Ireland at Maynooth and Dublin City University (DCU), and supported by Science Foundation Ireland (SFI). The authors would like to thank Felipe Soberon (Invent Cen- tre, DCU). His efforts in building the experimental setup for the plasma reactor have been of immense help. |
| Keywords: | semiconductor manufacturing; plasma process; process control; real-time control; |
| Academic Unit: | Faculty of Science and Engineering > Electronic Engineering |
| Item ID: | 9498 |
| Depositing User: | Professor John Ringwood |
| Date Deposited: | 22 May 2018 16:24 |
| Refereed: | Yes |
| Funders: | Science Foundation Ireland (SFI) |
| URI: | https://mu.eprints-hosting.org/id/eprint/9498 |
| Use Licence: | This item is available under a Creative Commons Attribution Non Commercial Share Alike Licence (CC BY-NC-SA). Details of this licence are available here |
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