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    Influence of uv light on the passive behaviour of SS316 - Effect of prior illumination


    Breslin, Carmel B., Macdonald, Digby D., Sikora, Janusz and Sikora, Elzbieta (1997) Influence of uv light on the passive behaviour of SS316 - Effect of prior illumination. Electrochimica Acta, 42 (1). pp. 127-136. ISSN 0013-4686

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    Abstract

    The influence of uv light (300 nm) on the nucleation of meta-stable pits on type 316 stainless steel in a neutral 0.5 mol dm−3 NaCl solution using current-time measurements is described. A significant increase in the induction periods and a decrease in the rate of pit nucleation were observed for specimens pre-passivated under illumination conditions, indicating that illumination leads to a modification of the passive film that persists even after irradiation is removed. This increased resistance to pitting attack is explained in terms of the semiconducting nature of the passive film and the Point Defect Model (PDM) for the growth and breakdown of passive films. It is proposed that generation of electron-hole pairs leads to a quenching of the electric field strength and consequent modification of the vacancy structure, leading to a decrease in the flux of cation vacancies across the barrier layer. Good agreement was observed between the ratios of experimentally measured and theoretically calculated induction periods for specimens pre-passivated in the dark and in the light.
    Item Type: Article
    Keywords: photo-inhibition; meta-stable pitting; SS316; uv light; passivity;
    Academic Unit: Faculty of Science and Engineering > Chemistry
    Item ID: 7951
    Identification Number: 10.1016/0013-4686(96)00177-6
    Depositing User: Dr. Carmel Breslin
    Date Deposited: 22 Feb 2017 15:22
    Journal or Publication Title: Electrochimica Acta
    Publisher: Elsevier B.V.
    Refereed: Yes
    Related URLs:
    URI: https://mu.eprints-hosting.org/id/eprint/7951
    Use Licence: This item is available under a Creative Commons Attribution Non Commercial Share Alike Licence (CC BY-NC-SA). Details of this licence are available here

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